ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,927, issued on April 21, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Photomask and method for insp... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,928, issued on April 21, was assigned to NIL Technology ApS (Kongens Lyngby, Denmark). "Metasurface coatings" was invented by Ulrich Quaad... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,930, issued on April 21, was assigned to Sumitomo Chemical Co. Ltd. (Tokyo). "Carboxylate, carboxylic acid generator, resist composition a... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,931, issued on April 21, was assigned to FUJIFILM Corp. (Tokyo). "Photosensitive transfer material, light shielding material, LED array, a... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,932, issued on April 21, was assigned to INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (Hsinchu, Taiwan). "Photosensitive composition and film ... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,933, issued on April 21, was assigned to DUPONT ELECTRONICS INC. (Wilmington, Del.). "Polymer compositions having photoacid generators and... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,934, issued on April 21, was assigned to Huawei Technologies Co. LTD. (Shenzhen, China). "Patterning material and patterned film" was inve... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,935, issued on April 21, was assigned to CHANGXIN MEMORY TECHNOLOGIES INC. (Hefei City, China). "Method of forming photoresist pattern, an... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,936, issued on April 21, was assigned to NISSAN CHEMICAL Corp. (Tokyo). "Film-forming composition having a multiple bond" was invented by ... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,937, issued on April 21, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "Photoresist top coating material ... Read More